MKS Instruments PF2-DUAL-AL76P-2 RF Matching Network

Technical Specifications

Model：PF2-DUAL-AL76P-2 Brand：MKS Instruments Product Type: PF2 series dual channel RF matching network

Module Feature

MKS PF2-DUAL-AL76P-2 is a dual-channel automatic RF matching network for semiconductor plasma processing equipment. It dynamically adjusts internal capacitance to match impedance between RF power supply and plasma load, minimizing reflected RF power. Fast auto-tuning response, high power handling capability. Integrated monitoring and protection circuits. Widely used on etching, CVD and PVD vacuum chamber plasma excitation.

Working principle: Built-in servo motors drive variable vacuum capacitors to continuously match the load impedance to the source impedance. Closed-loop control reduces reflected power and stabilizes plasma condition. Onboard components: Servo drive assembly, vacuum variable capacitors, impedance sensing circuit, control PCB, RF power port, multi-pin communication connector

LED indicatorsPower, RF active and fault LED indicators on unit housing

Hardware self-diagnosis

Visual inspection, servo motor movement test, impedance loop test, reflected power verification, interlock function test

Programming software

MKS RF match configuration software for tuning parameter setup, fault diagnosis and log reading

Electrical & Process Parameters

RF Frequency:13.56MHz Control supply:24V DC Control interface:Digital communication + analog I/O Cooling:Air cooling Process compatibility:Semiconductor plasma process gases

Mechanical & Structure

Mounting:Chassis or cabinet mounting Protection class:IP40

Environmental

Operating temperature:10℃ ~ +50℃ Ambient humidity:5~95% non-condensing Certification:CE, SEMI compliant Status:MKS PF2 series RF matching network

System compatibility

Works with MKS RF generator and vacuum chamber, provides stable plasma excitation for etch, PVD and CVD semiconductor process.

Function

PF2-DUAL-AL76P-2 dual channel RF matching network manufactured by MKS Instruments. It automatically tunes impedance to reduce reflected RF power and maintain stable plasma. Servo capacitor wear or contamination will cause slow tuning, high reflected power or tuning failure. It is core plasma impedance matching component for semiconductor vacuum process.

Installation

Follow lockout/tagout safety procedure before installation. Isolate RF power and vacuum system. Mount unit inside equipment cabinet, connect RF cables, 24V DC power and control signal cable. Perform tuning test and reflected power check before production startup.

Interface

RF input/output ports, multi-pin D-sub connector for DC power, digital communication and analog signals, status LED indicators on housing of PF2-DUAL-AL76P-2.

Diagnostic

High reflected power: Capacitor contamination or servo motor failure. Tuning timeout: Plasma load fluctuation or mechanical jam. No response: Power loss or communication wiring fault. Interlock triggered: Over-temperature or cover open protection.

Product Brief

PF2-DUAL-AL76P-2 MKS Instruments PF2 series dual channel RF matching network,13.56MHz,automatic impedance tuning,for semiconductor etch,PVD,CVD vacuum chamber plasma process stable RF power delivery.