Huttinger TIG30/100 RF Generator

Huttinger TIG30/100 3000W 13.56MHz RF power generator,used for semiconductor vacuum plasma coating and etching equipment.
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Products Description


Huttinger TIG30/100 RF Generator



Technical Specifications

Model:TIG30/100 Brand:Huttinger Product Type: 3000W RF generator

Module Feature

Huttinger TIG30/100 is high performance 3000W RF generator of Huttinger TIG series for semiconductor plasma process equipment. It outputs stable 13.56MHz RF power and works with matching network for plasma impedance matching. Built-in multi safety protection and local/remote control interface. Widely applied in semiconductor PVD, CVD and plasma etching vacuum equipment. Working principle: RF power generation Application frequency:13.56MHz Onboard components: RF power amplifier, control unit, protection circuit, power and signal connecting terminals

LED indicators

Equipped with front panel status LED indicators

Hardware self-diagnosis

RF output power test, insulation resistance test, reflected power inspection, alarm function test

Programming software

Huttinger service software for parameter configuration and fault diagnosis

Electrical Parameters

Input voltage: 230V AC Output power:3000W Application: Semiconductor vacuum plasma process

Mechanical & Structure

Mounting: Rack mount installation Protection class: IP20

Environmental

Operating temperature:10℃ ~ +45℃ Ambient humidity:5~85% non-condensing Certification: CE Status: Huttinger TIG series RF generator

System compatibility

TIG30/100 is compatible with Huttinger matching network and related spare parts for semiconductor vacuum plasma processing equipment.

Function

TIG30/100 is 13.56MHz RF generator manufactured by Huttinger. It provides 3000W continuous RF power for vacuum plasma thin film process. It supports automatic impedance matching to reduce reflected power. It has overvoltage, overcurrent, overheat and high reflected power protection. It supports local panel control and remote communication control. It is core power equipment for semiconductor thin film coating and etching.

Installation

Follow lockout/tagout safety procedure before installation. Cut off all power and discharge high voltage components. Install the RF generator into equipment rack. Connect AC power cable, RF coaxial cable and control signal cable. Check wiring terminals and insulation clearance. Restore power, run RF output test and alarm inspection.

Interface

50Ω RF coaxial output port, AC power terminals, signal communication ports, fixed mounting holes on TIG30/100.

Diagnostic

No RF output: Power supply fault, interlock trigger or cable damage. High reflected power: Impedance mismatch or coaxial cable defect. Overheat alarm: Insufficient cooling fan or internal component failure.



Product Brief

TIG30/100 Huttinger 3000W 13.56MHz RF generator,used for semiconductor vacuum plasma coating and etching process,RF plasma power source.


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