Huttinger TIG10/100 RF Generator

Huttinger TIG10/100 RF power generator,10kW output,13.56MHz,used for plasma etching,thin film deposition and semiconductor process equipment spare.
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Products Description


Huttinger TIG10/100 RF Generator



Technical Specifications

Model:TIG10/100 Brand:Huttinger Product Type: Solid-state RF power generator

Module Feature

Function: Huttinger TIG10/100 is solid-state RF generator designed for industrial plasma processes. Rated output power 10kW, fixed operating frequency 13.56MHz. Built-in power regulation circuit, supports constant power, constant voltage and constant current operation modes. Internal protection functions include over-temperature, over-current, over-voltage and reflected power protection. Widely used in semiconductor thin film deposition, plasma etching and vacuum coating equipment.

Working principle: Solid-state RF power amplification Output power: 10kW Frequency: 13.56 MHz Control interface: Analog / RS232 Cooling method: Water cooling Onboard components: RF power amplifier, control board, water cooling heat exchanger, power detection sensor, power supply unit

LED indicators: Power, fault, ready status LED indicators

Hardware self-diagnosis

Reflected power monitoring, temperature check, output power calibration, internal circuit status inspection

Programming software

Huttinger service software for parameter setting, status reading and fault log review

Electrical Parameters

Input voltage: 400VAC ±10%, 3-phase Power consumption: Max 12.5kVA

Mechanical & Structure

Mounting: Cabinet rack mount Protection class: IP20 (cabinet)

Environmental

Operating temperature: 10℃ ~ +40℃ Ambient humidity: 5~85% non-condensing Certification: CE Status: Huttinger industrial RF generator

System compatibility

Compatibility description: TIG10/100 works with matching network and vacuum plasma chamber. Suitable for semiconductor PVD, CVD and etching process systems.

Function

Function description: TIG10/100 is high frequency RF generator manufactured by Huttinger. It converts three-phase mains power into stable 13.56MHz RF power to excite plasma inside vacuum chamber. Built-in closed-loop power control maintains stable output power despite changing plasma load. Multiple safety protection mechanisms protect the unit from damage caused by mismatched load or abnormal operating conditions. Water cooling design ensures stable operation under continuous high power output. It is core power spare for semiconductor vacuum plasma processing equipment.

Installation

Installation steps: Follow lockout/tagout safety procedure before installation. Cut off all power supply. Install generator in standard equipment cabinet. Connect 3-phase main power, cooling water pipeline, RF coaxial cable to matching network. Wire analog and communication control signals. Check water flow and leak test. Restore power, perform power output test and alarm function verification.

Interface

Interface list: 3-phase power terminal, water cooling inlet/outlet, RF coaxial output port, analog control terminal, RS232 communication port, status signal terminals. LED indicators on front panel.

Diagnostic

Troubleshooting: No RF output: Check mains power, interlock circuit and water flow switch. High reflected power: Mismatched matching network or chamber plasma abnormal. Over temperature fault: Insufficient cooling water flow or blocked pipeline.

Product Brief

Brief description: TIG10/100 Huttinger solid-state RF generator,10kW,13.56MHz,water cooling,used for semiconductor vacuum plasma etching and thin film deposition,RF power supply spare.


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